Magnetic CoPt Nanoparticles Deposition using Plasma Focus Device
نویسندگان
چکیده
A 3.3 kJ pulsed plasma focus device (NX2) was used to deposit magnetic CoPt nano-particles on Si (100) substrates at a low charging voltage of about 8kv. The hydrogen was used as filling gas at different gas pressures (2, 4, 6, and 8 mbar) to investigate the morphological, structural and magnetic properties of nanostructure thin films, using scanning electron microscopy (SEM), X-ray diffraction (XRD), and vibrating sample magnetometer (VSM), for 25 focus shots depositions. It was observed that the nano-particles become more and more uniform and the particle-size decreases significantly with the increasing filling gas pressure. Magnetically hard fct phase CoPt nanoparticles, with high uniformity and narrow size distribution, were successfully synthesized by plasma focus device which may find application in high density data storage.
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